Comparison of continual and molecular modeling of gas flow...

Comparison of continual and molecular modeling of gas flow for diamond deposition

Gorbachev, Yu E, Leshchev, D V, Plotnikov, M Yu, Rebrov, A K, Yudin, I B
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Volume:
1382
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/1382/1/012152
Date:
November, 2019
File:
PDF, 2.45 MB
2019
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