Limited dose and angle-directed beam atomic layer etching...

Limited dose and angle-directed beam atomic layer etching and atomic layer deposition processes for localized film coatings on 3D sidewall structures

Seidel, Thomas E., Current, Michael I.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
38
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5133953
Date:
March, 2020
File:
PDF, 1.28 MB
2020
Conversion to is in progress
Conversion to is failed