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Limited dose and angle-directed beam atomic layer etching and atomic layer deposition processes for localized film coatings on 3D sidewall structures
Seidel, Thomas E., Current, Michael I.Volume:
38
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5133953
Date:
March, 2020
File:
PDF, 1.28 MB
2020