Improvement of Hf-based metal/oxide/nitride/oxide/Si...

Japanese Journal of Applied Physics 2020 / 04 Vol. 59; Iss. SG

Improvement of Hf-based metal/oxide/nitride/oxide/Si nonvolatile memory characteristics by Si surface atomically flattening

Ohmi, Shun-Ichiro, Horiuchi, Yusuke, Kudoh, Sohya
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Volume:
59
Journal:
Japanese Journal of Applied Physics
DOI:
10.35848/1347-4065/ab70ad
Date:
April, 2020
File:
PDF, 1.10 MB
2020
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