Influence of unintentionally incorporated Ar atoms on the...

Influence of unintentionally incorporated Ar atoms on the crystalline polarity of magnetron-sputtered Al-doped ZnO polycrystalline films on glass and sapphire substrates

Nomoto, Junichi, Nakajima, Tomohiko, Yamaguchi, Iwao, Tsuchiya, Tetsuo
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Volume:
38
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/1.5129684
Date:
March, 2020
File:
PDF, 2.24 MB
2020
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