[IEEE 2019 IEEE 26th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) - Hangzhou, China (2019.7.2-2019.7.5)] 2019 IEEE 26th International Symposium on Physical and Failure Analysis of Integrated Circuits (IPFA) - Nanoprobing Analysis on MOSFET Current Drift Caused by Gate Oxide Defect
Huang, Wei, Chua, Tze Ping, Bo Zhang, Hong, Song, C GYear:
2019
DOI:
10.1109/ipfa47161.2019.8984794
File:
PDF, 2.16 MB
2019