[IEEE 2019 IEEE 26th International Symposium on the...

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[IEEE 2019 IEEE 26th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA) - Hangzhou, China (2019.7.2-2019.7.5)] 2019 IEEE 26th International Symposium on Physical and Failure Analysis of Integrated Circuits (IPFA) - Nanoprobing Analysis on MOSFET Current Drift Caused by Gate Oxide Defect

Huang, Wei, Chua, Tze Ping, Bo Zhang, Hong, Song, C G
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Year:
2019
DOI:
10.1109/ipfa47161.2019.8984794
File:
PDF, 2.16 MB
2019
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