ALD Al 2 O 3 gate dielectric on the reduction of interface trap density and the enhanced photo-electric performance of IGO TFT
Chen, Kuan-Yu, Yang, Chih-Chiang, Huang, Chun-Yuan, Su, Yan-KuinVolume:
10
Year:
2020
Journal:
RSC Advances
DOI:
10.1039/D0RA00123F
File:
PDF, 752 KB
2020