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On-wafer monitoring and control of ion energy distribution for damage minimization in atomic layer etching processes
Hirata, Akiko, Fukasawa, Masanaga, Kugimiya, Katsuhisa, Nagaoka, Kohjiro, KARAHASHI, Kazuhiro, Hamaguchi, Satoshi, Iwamoto, HayatoJournal:
Japanese Journal of Applied Physics
DOI:
10.35848/1347-4065/ab7baa
Date:
March, 2020
File:
PDF, 607 KB
2020