Improved TDDB Reliability and Interface States in 5-nm Hf0.5Zr0.5O2 Ferroelectric Technologies Using NHâ Plasma and Microwave Annealing
Chen, Yi-Hsuan, Su, Chun-Jung, Yang, Ting-Hsin, Hu, Chenming, Wu, Tian-LiYear:
2020
Journal:
IEEE Transactions on Electron Devices
DOI:
10.1109/TED.2020.2973652
File:
PDF, 1.07 MB
2020