Evidence for anti-synergism between ion-assisted etching...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2020 / 03 Vol. 38; Iss. 2

Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma

Hirsch, Emilia W., Du, Linfeng, Economou, Demetre J., Donnelly, Vincent M.
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Volume:
38
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5138189
Date:
March, 2020
File:
PDF, 2.08 MB
2020
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