Some recent developments in chemical vapor deposition process and equipment modeling
Kleijn, C. R., Kuijlaars, K. J., Okkerse, M., van Santen, H., van den Akker, H. E.A.Volume:
09
Journal:
Le Journal de Physique IV
DOI:
10.1051/jp4:1999815
Date:
September, 1999
File:
PDF, 985 KB
1999