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The Influence of Resistance of the Epitaxial-Film Volume on the Capacity-Voltage Characteristics of the HgCdTe/AOF and HgCdTe/SiO2/Si3N4MIS Structures
A. V. Voitsekhovskii, S. N. Nesmelov, S. M. DzyadukhVolume:
48
Language:
english
Pages:
8
DOI:
10.1007/s11182-005-0174-2
Date:
June, 2005
File:
PDF, 415 KB
english, 2005