Influence of growth parameters on the morphology of GaAs nanowires grown on Si (111) by molecular beam epitaxy
Arpapay, Burcu, Duygulu, Ãzgür, Serincan, UÄurVolume:
111
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2020.104990
Date:
June, 2020
File:
PDF, 1.87 MB
2020