Hierarchically porous UiO-66 with tunable mesopores and oxygen vacancies for enhanced arsenic removal
Xu, Rongming, Ji, Qinghua, Zhao, Pin, Jian, Meipeng, Xiang, Chao, Hu, Chengzhi, Zhang, Gong, Tang, Chaochun, Liu, Ruiping, Zhang, Xiwang, Qu, JiuhuiYear:
2020
Journal:
Journal of Materials Chemistry A
DOI:
10.1039/C9TA13747E
File:
PDF, 2.41 MB
2020