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Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu
Han, Seung-Min, Nandi, Dip K., Joo, Yong-Hwan, Shigetomi, Toshiyuki, Suzuki, Kazuharu, Nabeya, Shunichi, Harada, Ryosuke, Kim, Soo-HyunVolume:
38
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5134696
Date:
May, 2020
File:
PDF, 4.57 MB
english, 2020