Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of high-K Gate Stacks
Wang, Chin I, Chang, Teng-Jan, Yin, Yu-Tung, Jiang, Yu-Sen, Shyue, Jing-Jong, Chen, Miin-JangLanguage:
english
Journal:
ACS Applied Electronic Materials
DOI:
10.1021/acsaelm.9b00819
Date:
March, 2020
File:
PDF, 1.69 MB
english, 2020