Nickel doped TiO 2 films by a...

Journal of Instrumentation 2020 / 03 Vol. 15; Iss. 03

Nickel doped TiO 2 films by a modified laser plasma source for photocatalytic applications

Velardi, L., Scrimieri, L., Vasco, G., Serra, A., Manno, D., Nassisi, V., Calcagnile, L., Quarta, G.
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Volume:
15
Language:
english
Journal:
Journal of Instrumentation
DOI:
10.1088/1748-0221/15/03/C03039
Date:
March, 2020
File:
PDF, 988 KB
english, 2020
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