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ChemInform Abstract: SOME ILLUMINATION ON THE MECHANISM OF SILICON DIOXIDE ETCHING IN HYDROFLUORIC ACID SOLUTIONS
NIELSEN, H., HACKLEMAN, D.Volume:
14
Journal:
Chemischer Informationsdienst
DOI:
10.1002/chin.198328013
Date:
July, 1983
File:
PDF, 217 KB
1983