Microstructure and properties of nanocrystalline Cu–Ta...

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Surface Engineering 2020 / 04

Microstructure and properties of nanocrystalline Cu–Ta thin films prepared by direct current magnetron sputtering

Tian, Wu, Dai, Jiaoyan, Zhang, Lijun, Chang, Yongqiang, Bao, Mingdong, Yu, Shengwang
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Journal:
Surface Engineering
DOI:
10.1080/02670844.2020.1748338
Date:
April, 2020
File:
PDF, 2.83 MB
2020
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