Polarity dependence in Cl2-based plasma etching of GaN,...

Applied Surface Science 2020 / 08 Vol. 521

Polarity dependence in Cl2-based plasma etching of GaN, AlGaN and AlN

Smith, Matthew D., Li, Xu, Uren, Michael J., Thayne, Iain G., Kuball, Martin
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Volume:
521
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2020.146297
Date:
August, 2020
File:
PDF, 1.56 MB
2020
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