Application of Bis[2-(3,4-epoxycyclohexyl)ethyl]...

Journal of Wuhan University of Technology-Mater. Sci. Ed. 2019 / 12 Vol. 34; Iss. 6

Application of Bis[2-(3,4-epoxycyclohexyl)ethyl] octamethyltetrasiloxane in the Preparation of a Photosensitive Resin for Stereolithography 3D Printing

Huang, Biwu, Han, Linlin, Wu, Baolin, Chen, Hao, Zhou, Wenbin, Lu, Zhenting
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Volume:
34
Journal:
Journal of Wuhan University of Technology-Mater. Sci. Ed.
DOI:
10.1007/s11595-019-2215-7
Date:
December, 2019
File:
PDF, 1.63 MB
2019
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