Study of Silicon Nitride Inner Spacer Formation in Process...

Nanomaterials 2020 / 04 Vol. 10; Iss. 4

Study of Silicon Nitride Inner Spacer Formation in Process of Gate-all-around Nano-Transistors

Li, Junjie, Li, Yongliang, Zhou, Na, Xiong, Wenjuan, Wang, Guilei, Zhang, Qingzhu, Du, Anyan, Gao, Jianfeng, Kong, Zhenzhen, Lin, Hongxiao, Xiang, Jinjuan, Li, Chen, Yin, Xiaogen, Wang, Xiaolei, Yang,
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
10
Journal:
Nanomaterials
DOI:
10.3390/nano10040793
Date:
April, 2020
File:
PDF, 3.20 MB
2020
Conversion to is in progress
Conversion to is failed