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Enhanced Performance of Atomic Layer Deposited Thin-Film Transistors With High-Quality ZnO/Al 2 O 3 Interface
Li, Huijin, Han, Dedong, Dong, Junchen, Yi, Zhuang, Zhou, Xiaobin, Zhang, Shengdong, Zhang, Xing, Wang, YiVolume:
67
Journal:
IEEE Transactions on Electron Devices
DOI:
10.1109/ted.2019.2957048
Date:
February, 2020
File:
PDF, 2.74 MB
2020