Selective etching of nanostructured a-Si:Al and its effect...

Thin Solid Films 2020 / 05 Vol. 702

Selective etching of nanostructured a-Si:Al and its effect on porosity, Al gradient and surface oxidation

Kjeldstad, T., Thøgersen, A., Stange, M., Jensen, I.T., Nilsen, O., Galeckas, A., Monakhov, E.
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Volume:
702
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2020.137982
Date:
May, 2020
File:
PDF, 977 KB
2020
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