Improvements in the synaptic operations of ferroelectric field-effect transistors using Hf 0.5 Zr 0.5 O 2 thin films controlled by oxygen partial pressures during the sputtering deposition process
Min, Dae-Hong, Ryu, Tae-Hyun, Yoon, So-Jung, Moon, Seung-Eon, Yoon, Sung-MinYear:
2020
Journal:
Journal of Materials Chemistry C
DOI:
10.1039/D0TC01105C
File:
PDF, 4.57 MB
2020