Developed an advanced chemical mechanical planarization for...

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Japanese Journal of Applied Physics 2020 / 04

Developed an advanced chemical mechanical planarization for 4H-SiC substrate by water-soluble inclusion complexes of fullerene

Tsai, Yueh-Hsun, Chen, Chaog-Chang Arthur, Suzuki, Keisuke, Khajornrungruang, Panart, Chiu, Shang-Fong, Hua, Chen-Ting
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Journal:
Japanese Journal of Applied Physics
DOI:
10.35848/1347-4065/ab8c9b
Date:
April, 2020
File:
PDF, 1.00 MB
2020
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