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(Keynote) Gate-All-Around Nanowire & Nanosheet FETs for Advanced, Ultra-Scaled Technologies
Veloso, Anabela, Matagne, Philippe, Jang, Doyoung, Huynh-Bao, Trong, Chasin, Adrian, Simoen, Eddy, Eneman, Geert, De Keersgieter, An, Mertens, Hans, Horiguchi, NaotoVolume:
97
Journal:
ECS Transactions
DOI:
10.1149/09705.0003ecst
Date:
May, 2020
File:
PDF, 1.49 MB
2020