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Strain induced variability study in Gate-All-Around vertically-stacked horizontal nanosheet transistors
Mohapatra, E, Dash, Taraprasanna, Jena, J R, Das, Sanghamitra, Maiti, C KJournal:
Physica Scripta
DOI:
10.1088/1402-4896/ab89f5
Date:
April, 2020
File:
PDF, 828 KB
2020