Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO 2 ) plasma enhanced atomic layer deposition (PEALD) processes
Li, Hu, Ito, Tomoko, Karahashi, Kazuhiro, Kagaya, Munehito, Moriya, Tsuyoshi, Matsukuma, Masaaki, Hamaguchi, SatoshiVolume:
59
Journal:
Japanese Journal of Applied Physics
DOI:
10.35848/1347-4065/ab8681
Date:
June, 2020
File:
PDF, 1.46 MB
2020