Study of buffer and epitaxy technology in two-step growth...

Science China Technological Sciences 2008 / 11 Vol. 51; Iss. 11

Study of buffer and epitaxy technology in two-step growth of aluminium nitride

QiJia Liu, Rong Zhang, ZiLi Xie, Bin Liu, Feng Xu, Jing Yao, Chao Nie, XiangQian Xiu, Ping Han, YouDou Zheng, HaiMei Gong
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Volume:
51
Language:
english
Pages:
5
DOI:
10.1007/s11431-008-0132-7
Date:
November, 2008
File:
PDF, 755 KB
english, 2008
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