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Fabrication and characteristics of ZnO MOS capacitors with high-KHfO2gate dielectrics
DeDong Han, Yi Wang, ShengDong Zhang, Lei Sun, JinFeng Kang, XiaoYan Liu, Gang Du, LiFeng Liu, RuQi HanVolume:
53
Language:
english
Pages:
4
DOI:
10.1007/s11431-010-4044-y
Date:
September, 2010
File:
PDF, 648 KB
english, 2010