Etch characteristics of Si1−xGexfilms in HNO3:H2O:HF

Science China Technological Sciences 2011 / 10 Vol. 54; Iss. 10

Etch characteristics of Si1−xGexfilms in HNO3:H2O:HF

ZhongYing Xue, Xing Wei, LinJie Liu, Da Chen, Bo Zhang, Miao Zhang, Xi Wang
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Volume:
54
Language:
english
Pages:
6
DOI:
10.1007/s11431-011-4501-2
Date:
October, 2011
File:
PDF, 738 KB
english, 2011
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