Stressor SiNx contact etch stop layer (CESL) technology and...

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Journal of Materials Science: Materials in Electronics 2020 / 5

Stressor SiNx contact etch stop layer (CESL) technology and its application in nano-scale transistors

Xu, Qiang, Xiong, Wenjuan, Wang, Guilei, Ye, Tianchun
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Journal:
Journal of Materials Science: Materials in Electronics
DOI:
10.1007/s10854-020-03553-x
Date:
May, 2020
File:
PDF, 1.35 MB
2020
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