Growth, physical and electrical characterization of nickel oxide thin films prepared by plasma-enhanced atomic layer deposition using nickelocene and oxygen precursors
Xie, Lin-Yan, Xiao, Dong-Qi, Pei, Jun-Xiang, Huo, Jingyong, Wu, Xiaohan, Liu, Wen-Jun, Ding, Shi-JinVolume:
7
Journal:
Materials Research Express
DOI:
10.1088/2053-1591/ab82c9
Date:
April, 2020
File:
PDF, 2.35 MB
2020