Etching of sub-10 nm half-pitch high chi block copolymers...

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Microelectronic Engineering 2020 / 5

Etching of sub-10 nm half-pitch high chi block copolymers for directed self-assembly (DSA) application

Cacho, Maria Gabriela Gusmão, Pimenta-Barros, Patricia, Argoud, Maxime, Navarro, Christophe, Sakavuyi, Kaumba, Tiron, Raluca, Possémé, Nicolas
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Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2020.111369
Date:
May, 2020
File:
PDF, 1.02 MB
2020
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