Formation of Hump Effect Due to Top-Gate Bias Stress in...

IEEE Electron Device Letters 2019 / 12 Vol. 40; Iss. 12

Formation of Hump Effect Due to Top-Gate Bias Stress in Organic Thin-Film Transistors

Chen, Hong-Chih, Tsao, Yu-Ching, Chu, An-Kuo, Huang, Hui-Chun, Lai, Wei-Chih, Chen, Guan-Fu, Huang, Shin-Ping, Chang, Ting-Chang, Chen, Po-Hsun, Chen, Jian-Jie, Kuo, Chuan-Wei, Zhou, Kuan-Ju, Hung, Ya
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Volume:
40
Journal:
IEEE Electron Device Letters
DOI:
10.1109/LED.2019.2949243
Date:
December, 2019
File:
PDF, 1.36 MB
2019
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