Topography Reduction During Barrier CMP Improved Due to...

Topography Reduction During Barrier CMP Improved Due to Tantalum Oxidation

Lefevre, Paul, Ina, Katsuyoshi, Sakai, Kenji, Tamai, Kazusei, Rader, Scott
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Volume:
732
Year:
2002
Journal:
MRS Proceedings
DOI:
10.1557/PROC-732-I4.5
File:
PDF, 234 KB
2002
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