Uniformity of Gate Dielectric for I/O and Core HK/MG...

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Journal of Electronic Materials 2020 / 5

Uniformity of Gate Dielectric for I/O and Core HK/MG pMOSFETs with Nitridation Treatments

Chou, Ching-Chuan, Shen, Tien-Szu, Chen, Jian-Ming, Chang, Cheng-Hsun-Tony, Wang, Shea-Jue, Lan, Wen-How, Wang, Mu-Chun
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Journal:
Journal of Electronic Materials
DOI:
10.1007/s11664-020-08182-y
Date:
May, 2020
File:
PDF, 3.42 MB
2020
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