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Atomic layer deposition of AlN using trimethylaluminium and ammonia
Beshkova, M, Deminskyi, P, Pedersen, H, Yakimova, RVolume:
1492
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/1492/1/012046
Date:
April, 2020
File:
PDF, 990 KB
2020