High H-atom Density in R(He,Ar)/x%(N2–5%H2) Early...

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Plasma Chemistry and Plasma Processing 2020 / 6

High H-atom Density in R(He,Ar)/x%(N2–5%H2) Early Afterglows

Ricard, André, Amorim, Jayr, Abdeladim, Mustapha, Sarrette, Jean- Philippe
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Journal:
Plasma Chemistry and Plasma Processing
DOI:
10.1007/s11090-020-10092-0
Date:
June, 2020
File:
PDF, 825 KB
2020
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