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Reduction of carbon impurities in aluminium nitride from time-resolved chemical vapour deposition using trimethylaluminum
Rouf, Polla, Sukkaew, Pitsiri, Ojamäe, Lars, Pedersen, HenrikJournal:
The Journal of Physical Chemistry C
DOI:
10.1021/acs.jpcc.0c01724
Date:
June, 2020
File:
PDF, 1.44 MB
2020