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Structural, Compositional, and Plasmonic Characteristics of TiâZr Ternary Nitride Thin Films Tuned by the Nitrogen Flow Ratio in Magnetron Sputtering
Chen, Lianlian, Ran, Yujing, Jiang, Zhaotan, Li, Yinglan, Wang, ZhiVolume:
10
Journal:
Nanomaterials
DOI:
10.3390/nano10050829
Date:
April, 2020
File:
PDF, 478 KB
2020