![](/img/cover-not-exists.png)
Arsenic Exposure and Methylation Efficiency in Relation to Oxidative Stress in Semiconductor Workers
Pan, Chih-Hong, Lin, Ching-Yu, Lai, Ching-Huang, Jeng, Hueiwang AnnaVolume:
11
Journal:
Atmosphere
DOI:
10.3390/atmos11050464
Date:
May, 2020
File:
PDF, 433 KB
2020