Influence of argon gas pressure on the ZnO:Al films...

Journal of Wuhan University of Technology-Mater. Sci. Ed. 2011 / 02 Vol. 26; Iss. 1

Influence of argon gas pressure on the ZnO:Al films deposited on flexible TPT substrates at room temperature by magnetron sputtering

Xiaojing Wang, Qingsong Lei, Junming Yuan, Wenli Zhou, Jun Yu
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Volume:
26
Language:
english
Pages:
4
DOI:
10.1007/s11595-011-0166-8
Date:
February, 2011
File:
PDF, 368 KB
english, 2011
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