![](/img/cover-not-exists.png)
A unified semi-global surface reaction model of polymer deposition and SiO2 etching in fluorocarbon plasma
Chang, Won Seok, Yook, Yeong Geun, You, Hae Sung, Park, Jae Hyeong, Kwon, Deuk Chul, Song, Mi Young, Yoon, Jung Sik, Kim, Dae Woong, You, Shin Jae, Yu, Dong Hun, Kwon, Hyoung-Cheol, Park, Sung Kye, ImVolume:
515
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2020.145975
Date:
June, 2020
File:
PDF, 1.56 MB
2020