Electron Beam Inspection in Physical Mode: Overpolish Monitoring of RMG CMP
Hafer, Richard F., Lin, Hong, Stamper, Andrew, Hsieh, Brian Yueh-Ling, Hsieh, JerryYear:
2020
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/TSM.2020.3000713
File:
PDF, 836 KB
2020