X-ray imaging and spectroscopy of nitrogen in the SiO2/SiC interface of the 4HâSiC MOSFET trench sidewalls
Isomura, Noritake, Kitazumi, Kousuke, Kataoka, Keita, KUTSUKI, Katsuhiro, Watanabe, YukihikoJournal:
Applied Physics Express
DOI:
10.35848/1882-0786/ab9ba4
Date:
June, 2020
File:
PDF, 1.25 MB
2020