Mass Transfer Limited KOH Etching in Crystalline Silicon...

ECS Journal of Solid State Science and Technology 2020 / 03 Vol. 9; Iss. 3

Mass Transfer Limited KOH Etching in Crystalline Silicon using a Confinement Mask

Tjiptowidjojo, Kristianto, Han, Seok Jun, Han, Sang Eon, Han, Sang M., Schunk, P. Randall
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Volume:
9
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2162-8777/ab8063
Date:
March, 2020
File:
PDF, 1.84 MB
2020
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