Tribological, Thermal and Kinetic Characterization of SiO...

ECS Journal of Solid State Science and Technology 2020 / 05 Vol. 9; Iss. 4

Tribological, Thermal and Kinetic Characterization of SiO 2 and Si 3 N 4 Polishing for STI CMP on Blanket and Patterned Wafers

Mariscal, Juan Cristobal, McAllister, Jeffrey, Sampurno, Yasa, Suarez, Jon Sierra, O’Neill, Mark, Zhou, Hongjun, Grief, Malcolm, Slutz, Dave, Philipossian, Ara
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Volume:
9
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2162-8777/ab89bc
Date:
May, 2020
File:
PDF, 1.96 MB
2020
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