Effects of various substrate materials on microstructural and optical properties of amorphous silicon oxynitride thin films deposited by plasma-enhanced chemical vapor deposition
Hang, Liangyi, Liu, Weiguo, Xu, Junqi, Yang, Chen, Zhou, ShunJournal:
Thin Solid Films
DOI:
10.1016/j.tsf.2020.138186
Date:
June, 2020
File:
PDF, 2.83 MB
2020
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