Efficient passivation and low resistivity for p + -Si/TiO 2 contact by atomic layer deposition
Mozaffari, Naeimeh, Shen, Heping, Yin, Yanting, Li, Yueliang, Hiller, Daniel, Jacobs, Daniel A., Nguyen, Hieu T, Phang, Pheng, Andersson, Gunther G, Kaiser, Ute, White, Thomas P., Weber, Klaus J., CatJournal:
ACS Applied Energy Materials
DOI:
10.1021/acsaem.0c00378
Date:
June, 2020
File:
PDF, 1.02 MB
2020